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Nanostructures Management Ultraviolet Gentle Technology


• Physics 15, s72

By etching nanostructures into ultraviolet-generating supplies, researchers present that they’ll manipulate the outgoing mild in ways in which aren’t in any other case potential.  

S. D. C. Roscam Abbing et al. [1]

Pulses of utmost ultraviolet (EUV) mild are used to check very quick processes and really small issues. Producing these pulses has develop into routine with a method referred to as high-harmonic technology, which makes use of an “upconversion” materials to remodel low-frequency pulses to high-frequency ones. The difficulty comes when making an attempt to govern this generated EUV mild, as most lenses and mirrors don’t work at these excessive frequencies. A brand new experiment exhibits that etching nanostructures within the upconversion materials can present a knob for controlling the emitted mild on the location the place it’s generated [1]. This enhanced functionality might assist in probing laptop chips and organic cells with EUV mild.

In high-harmonic technology, a number of seen or infrared photons are absorbed by a single atom or molecule inside an upconversion materials. This excited particle subsequently emits a single photon, whose frequency is an integer a number of of the unique frequency. Normally, the fabric is a fuel. Nonetheless, current curiosity has turned to strong supplies, which will be structured to supply some management on the properties of the emitted mild.

Of their experiments, Sylvianne Roscam Abbing from the Superior Analysis Middle for Nanolithography within the Netherlands and her colleagues shined infrared laser pulses on strong silica targets that had been etched with diffraction grating patterns. The staff noticed diffraction of the pulses even when the grating spacing was smaller than the enter laser’s wavelength, implying that the nanoscale grating affected the outgoing EUV mild. Rotating the grating relative to the enter laser’s polarization path, the researchers confirmed that they might management different points of the EUV mild, equivalent to its ultimate polarization state.

–Michael Schirber

Michael Schirber is a Corresponding Editor for Physics based mostly in Lyon, France.

References

  1. S. D. C. Roscam Abbing et al., “Excessive-ultraviolet shaping and imaging by high-harmonic technology from nanostructured silica,” Phys. Rev. Lett. 128, 223902 (2022).

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